Resolution and Functionality Enhancements in Optical Metrology
Steven Gillmer, Ph.D. Candidate, Precision Instrumentation Group
Tuesday, April 26, 2016
Scientific experiments continue to push engineering limits beyond the nano-scale, driving the development of extremely high resolution measurement tools and calibrations as a result. The effective implementation of optical metrology and its associated instrumentation involves a multi-disciplinary approach. This thesis draws from mechanical, electrical, and optical engineering subject areas in order to implement the proposed resolution and functionality enhancements. The discussion will focus on three forms of optical metrology: optical displacement sensing, scatterometry, and interferometric weak measurements. The primary applications of the advancements in optical displacement sensing lie in the measurement and calibration of computer numerical control (CNC) equipment and coordinate measuring machines (CMMs). A novel scatterometry tool will be presented for critical-dimension metrology in the continued sustenance of Moore’s law. Finally, optical displacement sensing and scatterometry will find parallels through weak measurements. Both application areas have potential for vast performance improvements via the measurement of a weak value. A variety of novel concepts and experiments will be presented within these fields of research with the ultimate goal of their dissemination into the manufacturing and semiconductor industries.