{"id":154482,"date":"2024-05-03T09:30:30","date_gmt":"2024-05-03T13:30:30","guid":{"rendered":"https:\/\/www.hajim.rochester.edu\/senior-design-day\/?p=154482"},"modified":"2025-05-02T15:19:07","modified_gmt":"2025-05-02T19:19:07","slug":"microscope-objective-for-lithography-wafer-alignment","status":"publish","type":"post","link":"https:\/\/www.hajim.rochester.edu\/senior-design-day\/microscope-objective-for-lithography-wafer-alignment\/","title":{"rendered":"Microscope Objective for Lithography Wafer Alignment"},"content":{"rendered":"\n<h2 class=\"wp-block-heading\">Team Members<\/h2>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Ben Margulies<\/li>\n\n\n\n<li>Colin Zhou<\/li>\n\n\n\n<li>Yichi Chen<\/li>\n\n\n\n<li>Zhenyu Li<\/li>\n<\/ul>\n\n\n\n<h2 class=\"wp-block-heading\">Customer <\/h2>\n\n\n\n<p>Kirill Sobolev, <em>ASML<\/em> <\/p>\n\n\n\n<h2 class=\"wp-block-heading\">1   Abstract<\/h2>\n\n\n\n<p>The purpose of our project is to design an objective lens for the ORION wafer alignment system in ASML\u2019s next-generation lithography machines. This lens will be integrated with an interferometer to achieve an extremely high level of measurement precision. The objective lens will be a 0.65 NA infinity corrected broadband optic, designed to operate effectively over a wavelength range of 500 &#8211; 1000 nm and with highly corrected polychromatic aberrations.<\/p>\n\n\n\n<p class=\"has-text-align-center\"><img loading=\"lazy\" decoding=\"async\" width=\"288\" height=\"243\" src=\"https:\/\/lh7-us.googleusercontent.com\/XHUyhhsj80q21MhSOzadlWvvwHsinKTFdBBe6MagEjFTxCapxcjHXmGFB2mdyncobjUX_EG0gce44e_5VxRqGPkUEda4Zm97k-wAjabTuYySh9lm6nPC9ZG_pdoph179AheYtH-ZiBAw2VkQyURs8A\"><\/p>\n\n\n\n<h2 class=\"wp-block-heading\">2   Vision<\/h2>\n\n\n\n<p>Throughout this project, our team aims to deepen our expertise in complex lens design and develop a manufacturable lens that meets or surpasses our stringent design specifications. By achieving these goals, we hope to contribute to the advancement of lithographic technology and enhance our capabilities as lens designers.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">3   Background<\/h2>\n\n\n\n<p>Our project is set to be utilized within ASML&#8217;s lithography machines by creating a broadband objective for ORION wafer alignment sensors, crucial for enhancing alignment and overlay accuracy in semiconductor manufacturing. This objective lens is engineered to perform optimally across a wide wavelength range of 500 to 1000 nm, ensuring high equipment performance.<\/p>\n\n\n\n<p>The design targets a numerical aperture (NA) of 0.65 and an effective focal length (EFL) of 6 mm, aiming for a field of view with a 0.05 mm radius and a 5 mm working distance. Critical to our objectives is controlling axial color aberration to less than 1 \u00b5m and maintaining polychromatic wavefront RMS at less than 15 nm or 0.023 waves. Special attention is given to minimizing wavefront odd aberrations, with a peak-to-valley measurement not exceeding 5 nm for combined coma. These specifications are designed to fulfill the demanding requirements of high-quality imaging needed in lithography wafer alignment processes.<\/p>\n\n\n\n<p><strong>Color Correction <\/strong><\/p>\n\n\n\n<p>For thin lens:<\/p>\n\n\n\n<p>Axial color:<\/p>\n\n\n\n<figure class=\"wp-block-image\"><img loading=\"lazy\" decoding=\"async\" width=\"527\" height=\"390\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-96.png\" alt=\"\" class=\"wp-image-181502\" srcset=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-96.png 527w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-96-300x222.png 300w\" sizes=\"auto, (max-width: 527px) 100vw, 527px\" \/><\/figure>\n\n\n\n<p>Secondary Color:<\/p>\n\n\n\n<figure class=\"wp-block-image\"><img loading=\"lazy\" decoding=\"async\" width=\"269\" height=\"50\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-97.png\" alt=\"\" class=\"wp-image-181522\"\/><\/figure>\n\n\n\n<p>Petzval:<\/p>\n\n\n\n<figure class=\"wp-block-image\"><img loading=\"lazy\" decoding=\"async\" width=\"269\" height=\"50\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-97.png\" alt=\"\" class=\"wp-image-181532\"\/><\/figure>\n\n\n\n<p>For secondary spectrum correction, the use of specific glass pairs such as BK7\/SF2 or FK52\/KZFS1 is effective. Implementing apochromat or superachromat lenses is advantageous for correcting chromatic aberrations across 3-4 wavelengths. During our research, we utilized Herzberger\u2019s approach, which facilitates the selection of glass types for doublets and triplets by utilizing plots of partial dispersion versus Abbe number. This method significantly simplifies the process of choosing appropriate glass materials.<\/p>\n\n\n\n<p>For NIR applications, combinations such as fused silica, BaF2, ZnSe, and LiF are suitable for crafting high-performance triplets. Research suggests that configurations such as triplet-doublet or triplet-triplet are optimal for creating faster optical systems. Additionally, triplets generally outperform doublets in apochromatic lens designs, offering superior image quality.<\/p>\n\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter\"><img loading=\"lazy\" decoding=\"async\" width=\"527\" height=\"390\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-96.png\" alt=\"\" class=\"wp-image-181512\" srcset=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-96.png 527w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-96-300x222.png 300w\" sizes=\"auto, (max-width: 527px) 100vw, 527px\" \/><\/figure>\n<\/div>\n\n\n<p class=\"has-text-align-center\"><em>Figure 3.1 V# vs Partial Dispersion http:\/\/opticalengineering.spiedigitallibrary.org\/<\/em><\/p>\n\n\n\n<div class=\"wp-block-group\"><div class=\"wp-block-group__inner-container is-layout-constrained wp-block-group-is-layout-constrained\">\n<h2 class=\"wp-block-heading\">4   Specifications<\/h2>\n<\/div><\/div>\n\n\n\n<h4 class=\"wp-block-heading\"><strong>The objective lens will meet the following specifications:<\/strong><\/h4>\n\n\n\n<figure class=\"wp-block-table\"><table><tbody><tr><td class=\"has-text-align-center\" data-align=\"center\" colspan=\"3\"><strong>Primary Specifications<\/strong><\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\"><strong>Specification<\/strong><\/td><td class=\"has-text-align-center\" data-align=\"center\"><strong>Value<\/strong><\/td><td class=\"has-text-align-center\" data-align=\"center\"><strong>Unit<\/strong><\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\">Numerical Aperture<\/td><td class=\"has-text-align-center\" data-align=\"center\">0.65<\/td><td class=\"has-text-align-center\" data-align=\"center\">\u2014<\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\">Wavelength<\/td><td class=\"has-text-align-center\" data-align=\"center\">500 \u2013 1000&nbsp;<\/td><td class=\"has-text-align-center\" data-align=\"center\">nm<\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\">Full Field&nbsp;<\/td><td class=\"has-text-align-center\" data-align=\"center\">0.05<\/td><td class=\"has-text-align-center\" data-align=\"center\">mm<\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\">Effective Focal Length<\/td><td class=\"has-text-align-center\" data-align=\"center\">6&nbsp;<\/td><td class=\"has-text-align-center\" data-align=\"center\">mm<\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\">Angle of Incidence and Refraction<\/td><td class=\"has-text-align-center\" data-align=\"center\">\u2264 45<\/td><td class=\"has-text-align-center\" data-align=\"center\">Degrees<\/td><\/tr><\/tbody><\/table><figcaption class=\"wp-element-caption\"><em>Table 4.1 Primary Specifications<\/em><\/figcaption><\/figure>\n\n\n\n<p><\/p>\n\n\n\n<figure class=\"wp-block-table\"><table><tbody><tr><td class=\"has-text-align-center\" data-align=\"center\" colspan=\"3\"><strong>Performance Specifications<\/strong><\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\"><strong>Specification<\/strong><\/td><td class=\"has-text-align-center\" data-align=\"center\"><strong>Value<\/strong><\/td><td class=\"has-text-align-center\" data-align=\"center\"><strong>Unit<\/strong><\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\">Axial Color<\/td><td class=\"has-text-align-center\" data-align=\"center\">&lt; 1&nbsp;<\/td><td class=\"has-text-align-center\" data-align=\"center\">\u03bcm\u00a0<\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\">Polychromatic Wavefront RMS at full field<\/td><td class=\"has-text-align-center\" data-align=\"center\">&lt; 0.023\u00a0<\/td><td class=\"has-text-align-center\" data-align=\"center\">waves<\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\">Combined Coma P-V <\/td><td class=\"has-text-align-center\" data-align=\"center\">&lt; 5&nbsp;<\/td><td class=\"has-text-align-center\" data-align=\"center\">nm<\/td><\/tr><\/tbody><\/table><figcaption class=\"wp-element-caption\"><em>Table 4.2 Performance Specifications<\/em><\/figcaption><\/figure>\n\n\n\n<p><\/p>\n\n\n\n<figure class=\"wp-block-table\"><table><tbody><tr><td class=\"has-text-align-center\" data-align=\"center\" colspan=\"3\"><strong>Packaging Specifications<\/strong><\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\"><strong>Specification<\/strong><\/td><td class=\"has-text-align-center\" data-align=\"center\"><strong>Value<\/strong><\/td><td class=\"has-text-align-center\" data-align=\"center\"><strong>Unit<\/strong><\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\">Working Distance [As-built]<\/td><td class=\"has-text-align-center\" data-align=\"center\">5<\/td><td class=\"has-text-align-center\" data-align=\"center\">mm&nbsp;<\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\">First element vertex to Image Plane Distance<\/td><td class=\"has-text-align-center\" data-align=\"center\">70.1<\/td><td class=\"has-text-align-center\" data-align=\"center\">mm&nbsp;<\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\">Number of Elements<\/td><td class=\"has-text-align-center\" data-align=\"center\">11<\/td><td class=\"has-text-align-center\" data-align=\"center\">\u2014<\/td><\/tr><\/tbody><\/table><figcaption class=\"wp-element-caption\"><em>Table 4.3 Packaging Specifications<\/em><\/figcaption><\/figure>\n\n\n\n<p><\/p>\n\n\n\n<figure class=\"wp-block-table\"><table><tbody><tr><td class=\"has-text-align-center\" data-align=\"center\" colspan=\"2\"><strong>Additional Notes<\/strong><\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\"><strong>Specification<\/strong><\/td><td class=\"has-text-align-center\" data-align=\"center\"><strong>Note<\/strong><\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\">Polychromatic Wavefront RMS&nbsp;<\/td><td class=\"has-text-align-center\" data-align=\"center\">Calculated at 632 nm wavelength for all fields. Wavefront specification is at best composite focus for all fields.<\/td><\/tr><tr><td class=\"has-text-align-center\" data-align=\"center\">Combined Coma P-V <\/td><td class=\"has-text-align-center\" data-align=\"center\">Evaluated with Zernike Coefficients Z7\/8 and Z14\/15 <\/td><\/tr><\/tbody><\/table><figcaption class=\"wp-element-caption\"><em>Table 4.4 Additional Notes<\/em><\/figcaption><\/figure>\n\n\n\n<div class=\"wp-block-group is-nowrap is-layout-flex wp-container-core-group-is-layout-ad2f72ca wp-block-group-is-layout-flex\">\n<div class=\"wp-block-group\"><div class=\"wp-block-group__inner-container is-layout-constrained wp-block-group-is-layout-constrained\">\n<div class=\"wp-block-group\"><div class=\"wp-block-group__inner-container is-layout-constrained wp-block-group-is-layout-constrained\">\n<h2 class=\"wp-block-heading\">5   Design Starting Point<\/h2>\n\n\n\n<p>To start our design, we completed a patent search for designs within our specification space. We narrowed our search by locating patent designs for microscope objectives that had long working distances as that is a primary specification that will determine many features of the lens. <\/p>\n\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full is-resized\"><img loading=\"lazy\" decoding=\"async\" width=\"530\" height=\"299\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-58.png\" alt=\"\" class=\"wp-image-180432\" style=\"width:606px;height:auto\" srcset=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-58.png 530w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-58-300x169.png 300w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-58-340x191.png 340w\" sizes=\"auto, (max-width: 530px) 100vw, 530px\" \/><figcaption class=\"wp-element-caption\">Figure 5.1 US Patent 6016226<\/figcaption><\/figure>\n<\/div><\/div><\/div>\n\n\n\n<p class=\"has-text-align-center\"><img loading=\"lazy\" decoding=\"async\" width=\"624\" height=\"375\" src=\"https:\/\/lh7-us.googleusercontent.com\/FrfKBjxCRcaC2_94qG-1pfDLv_Oz3IFf1an-_n_SN0_-adohyvZKUepASBCiahaaQAXs1R1plEsHu5ofYiJ98_D9GcD00bA2oY6RlMhX1HrKU14cFl54SH6ajbGgsCTx8Iyif_ztdi9NRpVB68vHZg\"><\/p>\n\n\n\n<p class=\"has-text-align-center\">Figure 5.2 US Patent 10281703<\/p>\n\n\n\n<p>With the patents, we take the lens prescriptions and import them into CODE V for further analysis. This initial evaluation focuses on lens performance, aberration balance, and material selection. After conducting an initial review, we begin the optimization phase. During this stage, we apply the various constraints to refine the patent design according to our specific requirements for the lens.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">6   Intermediate Design<\/h2>\n\n\n\n<p>After optimizing the initial patent designs, we explored the design space with multiple variations, each dependent on the starting parameters. Most of these designs closely approach but do not fully meet the performance specifications. From these intermediate designs, we carefully selected a subset to further refine as we progress toward our final design. Below are a few examples of these intermediate designs.<\/p>\n\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full is-resized\"><img loading=\"lazy\" decoding=\"async\" width=\"577\" height=\"376\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-63.png\" alt=\"\" class=\"wp-image-180602\" style=\"width:571px;height:auto\" srcset=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-63.png 577w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-63-300x195.png 300w\" sizes=\"auto, (max-width: 577px) 100vw, 577px\" \/><\/figure>\n<\/div>\n\n\n<p class=\"has-text-align-center\">Figure 6.1 Intermediate Design 1<\/p>\n\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"607\" height=\"392\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-64.png\" alt=\"\" class=\"wp-image-180652\" srcset=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-64.png 607w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-64-300x194.png 300w\" sizes=\"auto, (max-width: 607px) 100vw, 607px\" \/><\/figure>\n<\/div>\n\n\n<p class=\"has-text-align-center\">Figure 6.2 Intermediate Design 2<\/p>\n\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"501\" height=\"324\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-65.png\" alt=\"\" class=\"wp-image-180682\" srcset=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-65.png 501w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-65-300x194.png 300w\" sizes=\"auto, (max-width: 501px) 100vw, 501px\" \/><\/figure>\n<\/div>\n\n\n<p class=\"has-text-align-center\">Figure 6.3 Intermediate Design 3<\/p>\n\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"608\" height=\"396\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-68.png\" alt=\"\" class=\"wp-image-180712\" srcset=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-68.png 608w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-68-300x195.png 300w\" sizes=\"auto, (max-width: 608px) 100vw, 608px\" \/><\/figure>\n<\/div>\n\n\n<p class=\"has-text-align-center\">Figure 6.4 Intermediate Design 4<\/p>\n<\/div><\/div>\n<\/div>\n\n\n\n<h2 class=\"wp-block-heading\">7   Final Design<\/h2>\n\n\n\n<p>Our final lens design comprises 11 elements, including three doublets, an aplanatic singlet group, and an air-spaced triplet, ensuring comprehensive correction across the lens system. With a NA of 0.65 and an EFL of 6 mm, this lens features a total optical path from the first vertex to the image plane of 70.1 mm, and a working distance of 5 mm, optimized for semiconductor applications. The design incorporates three elements made from low dispersion glass to effectively minimize chromatic aberrations. It achieves a nominal performance of 0.016 waves RMS at full field, within the customer&#8217;s specification of 0.023 waves RMS with a reference wavelength of 632 nm.\u00a0<\/p>\n\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"605\" height=\"392\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-69.png\" alt=\"\" class=\"wp-image-180752\" srcset=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-69.png 605w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-69-300x194.png 300w\" sizes=\"auto, (max-width: 605px) 100vw, 605px\" \/><\/figure>\n<\/div>\n\n\n<p class=\"has-text-align-center\">Figure 7.1 Final Lens Design <\/p>\n\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"605\" height=\"379\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-92.png\" alt=\"\" class=\"wp-image-181302\" srcset=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-92.png 605w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-92-300x188.png 300w\" sizes=\"auto, (max-width: 605px) 100vw, 605px\" \/><figcaption class=\"wp-element-caption\">Figure 7.2 Field Aberrations<\/figcaption><\/figure>\n<\/div>\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"568\" height=\"735\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-93.png\" alt=\"\" class=\"wp-image-181312\" srcset=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-93.png 568w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-93-232x300.png 232w\" sizes=\"auto, (max-width: 568px) 100vw, 568px\" \/><\/figure>\n<\/div>\n\n\n<p class=\"has-text-align-center\">Figure 7.3.1 Transverse Ray Aberration Plot<\/p>\n\n\n<div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"565\" height=\"544\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-94.png\" alt=\"\" class=\"wp-image-181342\" srcset=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-94.png 565w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-94-300x289.png 300w\" sizes=\"auto, (max-width: 565px) 100vw, 565px\" \/><figcaption class=\"wp-element-caption\">Figure 7.3.2 Transverse Ray Aberration Plot<\/figcaption><\/figure>\n<\/div>\n\n\n<p>The plots displayed here illustrate the wavefront RMS tolerance yield of this lens design. The yield for the full field at 0.023 waves RMS is approximately 67 percent, meeting our customer&#8217;s expectations. This design includes an image plane compensator, as well as airspace and lens element compensators.<\/p>\n\n\n\n<figure class=\"wp-block-image\"><img loading=\"lazy\" decoding=\"async\" width=\"1396\" height=\"750\" src=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-95.png\" alt=\"\" class=\"wp-image-181492\" srcset=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-95.png 1396w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-95-300x161.png 300w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-95-1024x550.png 1024w, https:\/\/www.hajim.rochester.edu\/senior-design-day\/wp-content\/uploads\/2024\/05\/image-95-768x413.png 768w\" sizes=\"auto, (max-width: 1396px) 100vw, 1396px\" \/><\/figure>\n\n\n\n<p class=\"has-text-align-center\">Figure 7.2 Final Design Tolerance Analysis<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">8   Conclusion<\/h2>\n\n\n\n<p>Our 11-element lens design meets our customer&#8217;s performance and tolerance specifications. Moving forward, we will continue to explore the solution space with the goal of further improving the tolerance yield. We appreciate this opportunity to contribute to ASML\u2019s innovation in the semiconductor industry.\u00a0<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">9   Acknowledgements and References <\/h2>\n\n\n\n<div class=\"wp-block-group\"><div class=\"wp-block-group__inner-container is-layout-constrained wp-block-group-is-layout-constrained\">\n<p><strong>Acknowledgements: <\/strong>Thank you to Kirill Sobolev and Wayne Knox for their support and guidance throughout this project.<br><strong>References:<\/strong><\/p>\n\n\n\n<p><strong>[1]<\/strong> Taeko Toshi, 2019, MICROSCOPE OBJECTIVE LENS, US010281703B2. United States Patent and Trademark Office.<br><strong>[2]<\/strong> Aligning Lithography to the Nanometer.\u201d ASML, www.asml.com\/en\/news\/stories\/2021\/fellow-simon-mathijssen-aligning-lithography-nanometer. Accessed 14 Dec. 2023.<br><strong>[3]<\/strong> Ren, Deqing. \u201cApochromatic lenses for near-infrared astronomical instruments.\u201d Optical Engineering, vol. 38, no. 3, 1 Mar. 1999, p. 537, https:\/\/doi.org\/10.1117\/1.602131.<br><strong>[4]<\/strong> Development and Experimental Verification of an Analytic Model for Large Area Grating Couplers in Photonic Integrated Alignment Sensors, de Louw, N. 2022<br><strong>[5]<\/strong> Schott AG (April 2005). TIE-29: Refractive Index and Dispersion. In Technical Information \u2013 Optics For Devices (Section 2.2). Retrieved from https:\/\/wp.optics.arizona.edu\/optomech\/wp-content\/uploads\/sites\/53\/2016\/10\/tie-29_refractive_index_v2_us.pdf<br><strong>[6]<\/strong> Arisawa, K. (2000). U.S. Patent No. 6,016,226. Washington, DC: U.S. Patent and Trademark Office.<\/p>\n<\/div><\/div>\n","protected":false},"excerpt":{"rendered":"<p>Team Members Customer Kirill Sobolev, ASML 1 Abstract The purpose of our project is to design an objective lens for the ORION wafer alignment system in ASML\u2019s next-generation lithography machines.&hellip;<\/p>\n","protected":false},"author":6242,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_coblocks_attr":"","_coblocks_dimensions":"","_coblocks_responsive_height":"","_coblocks_accordion_ie_support":"","_monsterinsights_skip_tracking":false,"_monsterinsights_sitenote_active":false,"_monsterinsights_sitenote_note":"","_monsterinsights_sitenote_category":0,"footnotes":""},"categories":[4442,136],"tags":[],"coauthors":[8612],"class_list":["post-154482","post","type-post","status-publish","format-standard","hentry","category-archive","category-opt-ope-archive"],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.5 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Microscope Objective for Lithography Wafer Alignment - Senior Design Day<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/microscope-objective-for-lithography-wafer-alignment\/\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Microscope Objective for Lithography Wafer Alignment - Senior Design Day\" \/>\n<meta property=\"og:description\" content=\"Team Members Customer Kirill Sobolev, ASML 1 Abstract The purpose of our project is to design an objective lens for the ORION wafer alignment system in ASML\u2019s next-generation lithography machines.&hellip;\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.hajim.rochester.edu\/senior-design-day\/microscope-objective-for-lithography-wafer-alignment\/\" \/>\n<meta property=\"og:site_name\" content=\"Senior Design Day\" \/>\n<meta property=\"article:published_time\" content=\"2024-05-03T13:30:30+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2025-05-02T19:19:07+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/lh7-us.googleusercontent.com\/XHUyhhsj80q21MhSOzadlWvvwHsinKTFdBBe6MagEjFTxCapxcjHXmGFB2mdyncobjUX_EG0gce44e_5VxRqGPkUEda4Zm97k-wAjabTuYySh9lm6nPC9ZG_pdoph179AheYtH-ZiBAw2VkQyURs8A\" \/>\n<meta name=\"author\" content=\"admin\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"admin\" \/>\n\t<meta name=\"twitter:label2\" content=\"Est. reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"9 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\\\/\\\/schema.org\",\"@graph\":[{\"@type\":\"Article\",\"@id\":\"https:\\\/\\\/www.hajim.rochester.edu\\\/senior-design-day\\\/microscope-objective-for-lithography-wafer-alignment\\\/#article\",\"isPartOf\":{\"@id\":\"https:\\\/\\\/www.hajim.rochester.edu\\\/senior-design-day\\\/microscope-objective-for-lithography-wafer-alignment\\\/\"},\"author\":{\"name\":\"admin\",\"@id\":\"https:\\\/\\\/www.hajim.rochester.edu\\\/senior-design-day\\\/#\\\/schema\\\/person\\\/351018fbcf84ed8cac6d8072ba5b347c\"},\"headline\":\"Microscope Objective for Lithography Wafer Alignment\",\"datePublished\":\"2024-05-03T13:30:30+00:00\",\"dateModified\":\"2025-05-02T19:19:07+00:00\",\"mainEntityOfPage\":{\"@id\":\"https:\\\/\\\/www.hajim.rochester.edu\\\/senior-design-day\\\/microscope-objective-for-lithography-wafer-alignment\\\/\"},\"wordCount\":1087,\"image\":{\"@id\":\"https:\\\/\\\/www.hajim.rochester.edu\\\/senior-design-day\\\/microscope-objective-for-lithography-wafer-alignment\\\/#primaryimage\"},\"thumbnailUrl\":\"https:\\\/\\\/lh7-us.googleusercontent.com\\\/XHUyhhsj80q21MhSOzadlWvvwHsinKTFdBBe6MagEjFTxCapxcjHXmGFB2mdyncobjUX_EG0gce44e_5VxRqGPkUEda4Zm97k-wAjabTuYySh9lm6nPC9ZG_pdoph179AheYtH-ZiBAw2VkQyURs8A\",\"articleSection\":[\"3. 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