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Shestopalov’s Group

News

Jinhai's paper was accepted to Journal of Materials Chemistry C

April 14, 2016

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Installation of New Printing/Alignment/MTS Instrumentation is Completed

February 25, 2016

Installation of the new optomechanical system for the contact printing, pattern alignment, and surface adhesion measurements is now completed. The new instrumentation is located in Gavett 225. The custom built system was accuired as a part of the NSF Scalable Nanomanufacturing Project (NSF ECCS 1530540 award number)

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