Practicum of Electron Beam Lithography

                Xiaoshu Chen

                                            University of Rochester, Materials Science Program

                                                                                                             Rochester, NY 14627 chenxshu.ur@gmail.com

                                                                                                                                                 OPT407: SEM Practicum   Final Project , Spring 2010                                                                                                                                                                                                                                                                                                                        
 CONTENT
ABSTRACT

ELECTRON BEAM LITHOGRAPHY
  1. Sample Preparation
  2. Pattern design
  3. Pattern writing
  4. Develop
  5. Coating
 RESULTS & DISCUSSIONS
  1. SEM
  2. AFM
  3. Interaction Simulation

    4.
LAST THOUGHTS
  1. Conclusions
  2. Acknowledgement
  3. References
  4. Comment

         CONCLUSIONS
In this project, electron beam lithography was studied and practiced as a powerful tool to make fine structures in nano scale. Arrays of nanorods with surrounded Bragg mirrors were fabricated both with positive and negative exposure. Nano triangles and overlapped nano circles were negative exposed. The fabricated patterns were inspected by SEM and AFM. The SEM images show that in some patterns the proximity effect is serious and makes the edge and corners of pattern blur. Electron dose is a critical parameter in lithography. The results show over exposed and insufficient exposed patterns. To get better lithography pattern, more practices and experiences are needed.  AFM provides accurate and high resolution in three dimensions and reveals a vivid nano scale world.
     
            ACKNOWLEDGEMENTS  
Thank you to Brian McIntyre for his guide in this course and kind help with the project. Thanks to Andreas and Mike for guidance in electron  beam lithography.

            REFERENCES                   
Egerton, Ray F. Physical Principles of Electron Microscopy: An Introduction to TEM, SEM, and AEM. New York: Springer, 2007.
http://www.microchem.com/
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       Xiaoshu Chen, April  2010

        

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