Focus Ion Beam Lithography
The FIB lithography was performed via the use of Zeiss Auriga. This process is complex but provides very powerful results. The FIB lithography technique is essentially an ablation lithography using the ion beam with gallium ions. These gallium ions are knocking out some of the sample material and then we were left with the stamp shown in Figure 2.0. For this sample the FIB used a 600pA current for approximately 135 seconds.
Figure 2.0: Focus Ion Beam
Lithography on the surface of the shape-memory
polymer.
Colourization
Adobe Photoshop CS6 Extended to colourize the greyscale image to make them visually appealing.
Figure
2.1: Colourization of the lithography
image. Yellow area indicates where the FIB
was in contact with the sample.
