Graduate teaching assistantship in Optics

A discussion of the properties of light: refraction, imaging, diffraction, interference, the development of the microscope, telescope, laser, the Internet, information storage and display, and medical applications. Demonstrations. The EAS10X seminar/workshop is required for all students taking an EAS10X course for credit. Seminars discuss engineering and applied sciences in the real world, and provide overviews of Optics, Computer Science, Mechanical Engineering, Biomedical Engineering, Electrical and Computer Engineering, Audio and Music Engineering, and Chemical Engineering.

Location

Goergen Hall Room 101 (TR 12:30PM - 1:45PM)

Course will provide a basic understanding of CNC machining and deterministic micro grinding processes for spherical and aspheric shapes in optical substrates. Course runs 8/31-11/4.

Location

Gavett Hall Room 118 (TR 12:30PM - 2:20PM)

Students will gain an understanding in CNC sub-aperture fine grinding, and polishing of spherical and aspheric surfaces. Course runs 8/31-11/4.

Location

Gavett Hall Room 118 (TR 12:30PM - 2:20PM)

course will provide a basic understanding of CNC sub-aperture form correction of pre-polished optical substrates using MRF technology (Magnetorheological Finishing). Course will run 8/30-11/3.

Location

Goergen Hall Room 429 (MW 1:00PM - 2:50PM)

Students examine, analyze, measure, dismantle and reverse-engineer a variety of new and used optical tools, apparatus and systems. Emphasis on conceptual understanding and intuitive problem-solving.

Location

Wilmot Room 504 (MW 6:15PM - 9:55PM)

Students examine, analyze, measure, dismantle and reverse-engineer a variety of new and used optical tools, apparatus and systems. Emphasis on conceptual understanding and intuitive problem-solving.

Location

Wilmot Room 504 (TR 3:25PM - 6:05PM)

Students examine, analyze, measure, dismantle and reverse-engineer a variety of new and used optical tools, apparatus and systems. Emphasis on conceptual understanding and intuitive problem-solving.

Location

Wilmot Room 504 (TR 6:15PM - 9:55PM)

This laboratory complements OPT 242. Students experience further optical phenomena in the lab setting to better understand equipment that provides measurement and key optical data.

Location

Hylan Building Room 202 (M 9:00AM - 10:15AM)

This laboratory complements OPT 242. Students experience further optical phenomena in the lab setting to better understand equipment that provides measurement and key optical data.

Location

Goergen Hall Room 427 (T 6:15PM - 9:15PM)

This laboratory complements OPT 242. Students experience further optical phenomena in the lab setting to better understand equipment that provides measurement and key optical data.

Location

Goergen Hall Room 427 (F 12:30PM - 3:30PM)

This laboratory complements OPT 242. Students experience further optical phenomena in the lab setting to better understand equipment that provides measurement and key optical data.

Location

Goergen Hall Room 427 (R 6:15PM - 9:15PM)

This laboratory complements OPT 242. Students experience further optical phenomena in the lab setting to better understand equipment that provides measurement and key optical data.

Location

Goergen Hall Room 427 (W 6:15PM - 9:15PM)

This course is formerly known as ECE 210 Circuits for non majors. This is a 4 credit hour course, with laboratory, intended for physical scientists and (non-electrical) engineers. Electrical concepts will be developed based on modern needs and techniques: Current, Voltage, Components, Sources, Operational Amplifiers, Analysis Techniques, First and Second Order Circuits, Sinusoids and AC. Technical elective for non-ECE majors.

prerequisites: Concurrent registration in MTH 165 and PHY 122

Location

Gavett Hall Room 206 (WF 4:50PM - 6:05PM)

This course is formerly known as ECE 210 Circuits for non majors. This is a 4 credit hour course, with laboratory, intended for physical scientists and (non-electrical) engineers. Electrical concepts will be developed based on modern needs and techniques: Current, Voltage, Components, Sources, Operational Amplifiers, Analysis Techniques, First and Second Order Circuits, Sinusoids and AC. Technical elective for non-ECE majors.

prerequisites: Concurrent registration in MTH 165 and PHY 122

Location

Gavett Hall Room 306 (T 7:40PM - 9:40PM)

This course is formerly known as ECE 210 Circuits for non majors. This is a 4 credit hour course, with laboratory, intended for physical scientists and (non-electrical) engineers. Electrical concepts will be developed based on modern needs and techniques: Current, Voltage, Components, Sources, Operational Amplifiers, Analysis Techniques, First and Second Order Circuits, Sinusoids and AC. Technical elective for non-ECE majors.

prerequisites: Concurrent registration in MTH 165 and PHY 122

Location

Gavett Hall Room 306 (W 2:35PM - 4:40PM)

This course is formerly known as ECE 210 Circuits for non majors. This is a 4 credit hour course, with laboratory, intended for physical scientists and (non-electrical) engineers. Electrical concepts will be developed based on modern needs and techniques: Current, Voltage, Components, Sources, Operational Amplifiers, Analysis Techniques, First and Second Order Circuits, Sinusoids and AC. Technical elective for non-ECE majors.

prerequisites: Concurrent registration in MTH 165 and PHY 122

Location

Gavett Hall Room 206 (M 6:15PM - 7:30PM)

Teaches techniques of transforming continuous problems to discrete mathematical models. Students learn computational methods for solving problems in optics using high level software. Includes labs.

Location

(M 7:40PM - 10:20PM)

MATLAB II for Optics Majors. Prerequisites: OPT 211

Location

Bausch & Lomb Room 109 (M 10:25AM - 11:40AM)

MATLAB I for Optics Majors

Location

Gavett Hall Room 208 (W 8:00AM - 8:50AM)

MATLAB for Optics Majors. Prerequisites: OPT 211

Location

Harkness Room 114 (F 9:00AM - 10:15AM)

Optical instruments and their uses. First-order Gaussian optics and thin-lens system layout. Photometric theory applied to optical systems. The eye, magnifier, microscope, matrix optics, nature of Seidel aberrations.

Location

Computer Studies Room 209 (TR 2:00PM - 3:15PM)

Optical instruments and their uses. First-order Gaussian optics and thin-lens system layout. Photometric theory applied to optical systems. The eye, magnifier, microscope, matrix optics, nature of Seidel aberrations.

Location

Gavett Hall Room 312 (T 6:15PM - 7:30PM)

Optical instruments and their uses. First-order Gaussian optics and thin-lens system layout. Photometric theory applied to optical systems. The eye, magnifier, microscope, matrix optics, nature of Seidel aberrations.

Location

Meliora Room 218 (T 6:15PM - 7:30PM)

Optical instruments and their uses. First-order Gaussian optics and thin-lens system layout. Photometric theory applied to optical systems. The eye, magnifier, microscope, matrix optics, nature of Seidel aberrations.

Location

Hylan Building Room 203 (T 6:15PM - 7:30PM)

Optical instruments and their uses. First-order Gaussian optics and thin-lens system layout. Photometric theory applied to optical systems. The eye, magnifier, microscope, matrix optics, nature of Seidel aberrations.

Location

Lechase Room 181 (W 3:25PM - 4:40PM)

Optical instruments and their uses. First-order Gaussian optics and thin-lens system layout. Photometric theory applied to optical systems. The eye, magnifier, microscope, matrix optics, nature of Seidel aberrations.

Location

Hopeman Hall Room 335 (W 3:25PM - 4:40PM)

Optical instruments and their uses. First-order Gaussian optics and thin-lens system layout. Photometric theory applied to optical systems. The eye, magnifier, microscope, matrix optics, nature of Seidel aberrations.

Location

Todd Union Room 202 (W 3:25PM - 4:40PM)

Optical instruments and their uses. First-order Gaussian optics and thin-lens system layout. Photometric theory applied to optical systems. The eye, magnifier, microscope, matrix optics, nature of Seidel aberrations.

Location

Lattimore Room 431 (T 6:15PM - 7:30PM)

Optical instruments and their uses. First-order Gaussian optics and thin-lens system layout. Photometric theory applied to optical systems. The eye, magnifier, microscope, matrix optics, nature of Seidel aberrations.

Location

Genesee Hall Room 309 (W 3:25PM - 4:40PM)

Geometrical and diffraction theory of image formation. Measurement of first-order properties. Seidel aberrations. Tests of aberrated systems. Seidel contribution formulae and more. Optics majors have more fun! Prerequisites: OPT 241, OPT 261.

Location

Meliora Room 221 (TR 12:30PM - 1:45PM)

Geometrical and diffraction theory of image formation. Measurement of first-order properties. Seidel aberrations. Tests of aberrated systems. Seidel contribution formulae and more. Prerequisites: OPT 241, OPT 261.

Location

Goergen Hall Room 108 (F 3:25PM - 4:40PM)

This course is designed to give engineers practical information about how optical components (lenses) are made and tested, and provide basic tools to create cost-effective optical system designs. Topics covered include optical material properties, grinding, polishing, CNC programming for optical fabrication, modern fabrication technologies, surface testing and fabrication tolerances. We will discuss case studies of challenging fabrication projects for leading-edge optical systems. The accompanying lab will use the facilities of the Hopkins Center fabrication and metrology labs to introduce polishing and metrology techniques. Lab exercises will include hands-on experiments, such as exploring the properties of optical materials, measuring the removal function of a sub-aperture polishing and grinding machines, and characterizing the surface form and texture of polished surfaces. Prerequisites: Students must in their Sophomore, Junior, or Senior year. Not for first-year undergraduates.

Location

Wilmot Room 116 (MW 3:25PM - 4:40PM)

This course is designed to give engineers practical information about how optical components (lenses) are made and tested, and provide basic tools to create cost-effective optical system designs. Topics covered include optical material properties, grinding, polishing, CNC programming for optical fabrication, modern fabrication technologies, surface testing and fabrication tolerances. We will discuss case studies of challenging fabrication projects for leading-edge optical systems. The accompanying lab will use the facilities of the Hopkins Center fabrication and metrology labs to introduce polishing and metrology techniques. Lab exercises will include hands-on experiments, such as exploring the properties of optical materials, measuring the removal function of a sub-aperture polishing and grinding machines, and characterizing the surface form and texture of polished surfaces. Prerequisites: Students must in their Sophomore, Junior, or Senior year. Not for first-year undergraduates.

Location

Goergen Hall Room 427 (M 9:00AM - 12:00PM)

This course is designed to give engineers practical information about how optical components (lenses) are made and tested, and provide basic tools to create cost-effective optical system designs. Topics covered include optical material properties, grinding, polishing, CNC programming for optical fabrication, modern fabrication technologies, surface testing and fabrication tolerances. We will discuss case studies of challenging fabrication projects for leading-edge optical systems. The accompanying lab will use the facilities of the Hopkins Center fabrication and metrology labs to introduce polishing and metrology techniques. Lab exercises will include hands-on experiments, such as exploring the properties of optical materials, measuring the removal function of a sub-aperture polishing and grinding machines, and characterizing the surface form and texture of polished surfaces. Prerequisites: Students must in their Sophomore, Junior, or Senior year. Not for first-year undergraduates.

Location

Goergen Hall Room 427 (W 9:00AM - 11:50AM)

This course is designed to give engineers practical information about how optical components (lenses) are made and tested, and provide basic tools to create cost-effective optical system designs. Topics covered include optical material properties, grinding, polishing, CNC programming for optical fabrication, modern fabrication technologies, surface testing and fabrication tolerances. We will discuss case studies of challenging fabrication projects for leading-edge optical systems. The accompanying lab will use the facilities of the Hopkins Center fabrication and metrology labs to introduce polishing and metrology techniques. Lab exercises will include hands-on experiments, such as exploring the properties of optical materials, measuring the removal function of a sub-aperture polishing and grinding machines, and characterizing the surface form and texture of polished surfaces. Prerequisites: Students must be in their Sophomore, Junior, or Senior year. Not for first-year undergraduates.

Location

Goergen Hall Room 427 (R 3:00PM - 5:50PM)

This course focuses teaching the multidisciplinary aspects of designing complex, precise systems. In these systems, aspects from mechanics, optics, electronics, design for manufacturing/assembly, and metrology/qualification must all be considered to design, build, and demonstrate a successful precision system. The goal of this class is to develop a fundamental understanding of multidisciplinary design for designing the next generation of advanced instrumentation. This course is open to graduate students in engineering and physics backgrounds although it has a strong emphasis on mechanical engineering and systems engineering topics. This course is open to undergraduates who are in their senior year.

Location

Morey Room 501 (TR 4:50PM - 6:05PM)

Optical interference in a multilayer stack and its application to anti-reflection coatings, beamsplitters, laser mirrors, polarizers, and bandpass filters. Prerequisites: OPT 262

Location

Bausch & Lomb Room 270 (TR 3:25PM - 4:40PM)

!!!Time of the class will be determined after registration based on all student's availability!!! This laboratory course (3 hours per week) exposes students to cutting-edge photon counting instrumentation and methods with applications ranging from quantum information to nanotechnology, biotechnology and medicine. Major topics include quantum entanglement and Bells inequalities, single-photon interference, single-emitter confocal fluorescence microscopy and spectroscopy, photonic bandgap materials, Hanbury Brown and Twiss interferometer, and photon antibunching. Each lab also includes lecture and discussions of lab materials.

Location

Wilmot Room 116 (S 8:00AM - 8:15AM)

Electromagnetic Theory: Maxwell's equations in differential form, dipole radiation, Rayleigh scattering, polarization,energy flow (Poynting vector), plane waves, wave propagation in air/glass/metals, reflection and refraction, birefringence, polarization-sensitive optical elements (wave plates and polarizers),applications to nonlinear and quantum optics.

Location

Goergen Hall Room 109 (TR 9:40AM - 10:55AM)

Electromagnetic Theory: Maxwell's equations in differential form, dipole radiation, Rayleigh scattering, polarization,energy flow (Poynting vector), plane waves, wave propagation in air/glass/metals, reflection and refraction, birefringence, polarization-sensitive optical elements (wave plates and polarizers),applications to nonlinear and quantum optics.

Location

Goergen Hall Room 417 (M 2:00PM - 3:15PM)

Specifications, project development, and project planning will include design alternatives and subsystem segmentation discussions. Prerequisites: Optics senior standing or permission from instructor.

Location

Gavett Hall Room 301 (MWF 11:50AM - 12:40PM)

Under faculty supervision, preparation for year-long independent research or participation in ongoing graduate group research. Students wishing to major in 'Optics' will register for this course. Prerequisite: Optics senior standing or instructor permission.

Location

Gavett Hall Room 301 (MWF 11:50AM - 12:40PM)

Registration for Independent Study courses needs to be completed thru the instructions for online independent study registration.

Registration for Independent Study courses needs to be completed thru the instructions for online independent study registration.

Registration for Independent Study courses needs to be completed thru the instructions for online independent study registration.