Undergraduate Program

Fall Term Schedule

Fall 2025

Number	Title	Instructor	Time
OPT 1000-1 Teaching Assistantship Gary Wicks 7:00PM - 7:00PM
Graduate teaching assistantship in Optics Location ( 7:00PM - 7:00PM)
OPT 1001-1 Research Assistantship – 7:00PM - 7:00PM
Graduate research assistantship in Optics. Location ( 7:00PM - 7:00PM)
OPT 101-1 Introduction to Optics Thomas Brown TR 12:30PM - 1:45PM
This course provides foundational knowledge of the science and technology of light. It includes energy, with special attention to solar cells, lenses and imaging, interference, diffraction, holography, lasers, photonics, optical technologies for the internet, and quantum optics. Students will have the opportunity to have a lab-based experience in faculty research labs. Small group workshops offer the opportunity for hands-on demonstrations and group practice in problem solving. Location (TR 12:30PM - 1:45PM)
OPT 145-01 Cnc Grind for Precision Mfg Michael Pomerantz TR 11:05AM - 12:20PM
No description Location (TR 11:05AM - 12:20PM)
OPT 146-01 Cnc Finish & Precision Mfg Michael Pomerantz TR 11:05AM - 12:20PM
No description Location (TR 11:05AM - 12:20PM)
OPT 201-1 Geometrical Optics Lab Lect Michele Cotrufo MW 6:15PM - 8:55PM
OPT 201 explores the geometrical optics (ray-based) imaging behavior of optical systems. This class consists of four lab modules. 1. Measurement Methods and Measurement Uncertainty 2. Object/Image Relationships 3. Measuring Focal Length and First-Order Properties 4. Resolution and Spatial Frequency The typical activities for each lab include a: • Lab Lecture (pre-recorded) that provides background, context and relevant theory for the lab activities and data analysis. • Homework assignment where the student practices analysis procedures relevant to the lab, • Pre-lab that goes over the procedures of the lab, • Data acquisition done in lab • Data analysis activity and • Lab report documenting the findings of the lab in a designated format. Location (MW 6:15PM - 8:55PM)
OPT 201-2 Geometrical Optics Lab Lect Michele Cotrufo TR 9:40AM - 12:20PM
OPT 201 explores the geometrical optics (ray-based) imaging behavior of optical systems. This class consists of four lab modules. 1. Measurement Methods and Measurement Uncertainty 2. Object/Image Relationships 3. Measuring Focal Length and First-Order Properties 4. Resolution and Spatial Frequency The typical activities for each lab include a: • Lab Lecture (pre-recorded) that provides background, context and relevant theory for the lab activities and data analysis. • Homework assignment where the student practices analysis procedures relevant to the lab, • Pre-lab that goes over the procedures of the lab, • Data acquisition done in lab • Data analysis activity and • Lab report documenting the findings of the lab in a designated format. Location (TR 9:40AM - 12:20PM)
OPT 201-3 Geometrical Optics Lab Lect Michele Cotrufo TR 3:25PM - 6:05PM
OPT 201 explores the geometrical optics (ray-based) imaging behavior of optical systems. This class consists of four lab modules. 1. Measurement Methods and Measurement Uncertainty 2. Object/Image Relationships 3. Measuring Focal Length and First-Order Properties 4. Resolution and Spatial Frequency The typical activities for each lab include a: • Lab Lecture (pre-recorded) that provides background, context and relevant theory for the lab activities and data analysis. • Homework assignment where the student practices analysis procedures relevant to the lab, • Pre-lab that goes over the procedures of the lab, • Data acquisition done in lab • Data analysis activity and • Lab report documenting the findings of the lab in a designated format. Location (TR 3:25PM - 6:05PM)
OPT 201-4 Geometrical Optics Lab Lect Michele Cotrufo 7:00PM - 7:00PM
Any student attending OPT-201 should enroll in this session and reserve this time. This time slot will be used for make-up lab sessions, make-up classes and other items. We will not meet on Friday every week. The instructor will make announcements on BB when students need to come in at this time. OPT 201 explores the geometrical optics (ray-based) imaging behavior of optical systems. This class consists of four lab modules. 1. Measurement Methods and Measurement Uncertainty 2. Object/Image Relationships 3. Measuring Focal Length and First-Order Properties 4. Resolution and Spatial Frequency The typical activities for each lab include a: • Lab Lecture (pre-recorded) that provides background, context and relevant theory for the lab activities and data analysis. • Homework assignment where the student practices analysis procedures relevant to the lab, • Pre-lab that goes over the procedures of the lab, • Data acquisition done in lab • Data analysis activity and • Lab report documenting the findings of the lab in a designated format. Location ( 7:00PM - 7:00PM)
OPT 203-1 Instrumentation Lab Jennifer Kruschwitz M 9:00AM - 10:15AM
This laboratory complements OPT 242. Students experience further optical phenomena in the lab setting to better understand equipment that provides measurement and key optical data. Prerequisites: OPT 202 or instructor permission Location (M 9:00AM - 10:15AM)
OPT 203-2 Instrumentation Lab Jennifer Kruschwitz 7:00PM - 7:00PM
This laboratory complements OPT 242. Students experience further optical phenomena in the lab setting to better understand equipment that provides measurement and key optical data. Prerequisites: OPT 202 or instructor permission Location ( 7:00PM - 7:00PM)
OPT 203-3 Instrumentation Lab Jennifer Kruschwitz 7:00PM - 7:00PM
This laboratory complements OPT 242. Students experience further optical phenomena in the lab setting to better understand equipment that provides measurement and key optical data. Prerequisites: OPT 202 or instructor permission Location ( 7:00PM - 7:00PM)
OPT 203-4 Instrumentation Lab Jennifer Kruschwitz 7:00PM - 7:00PM
This laboratory complements OPT 242. Students experience further optical phenomena in the lab setting to better understand equipment that provides measurement and key optical data. Prerequisites: OPT 202 or instructor permission Location ( 7:00PM - 7:00PM)
OPT 203-5 Instrumentation Lab Jennifer Kruschwitz 7:00PM - 7:00PM
This laboratory complements OPT 242. Students experience further optical phenomena in the lab setting to better understand equipment that provides measurement and key optical data. Prerequisites: OPT 202 or instructor permission Location ( 7:00PM - 7:00PM)
OPT 210-5 Circuit Analysis for System Thinking Edward Herger WF 4:50PM - 6:05PM
This course is formerly known as ECE 210 Circuits for non majors. This is a 4 credit hour course, with laboratory, intended for physical scientists and (non-electrical) engineers. Electrical concepts will be developed based on modern needs and techniques: Current, Voltage, Components, Sources, Operational Amplifiers, Analysis Techniques, First and Second Order Circuits, Sinusoids and AC. Technical elective for non-ECE majors. prerequisites: Concurrent registration in MTH 165 and PHY 122 Location (WF 4:50PM - 6:05PM)
OPT 210-6 Circuit Analysis for System Thinking Edward Herger M 6:15PM - 7:30PM
This course is formerly known as ECE 210 Circuits for non majors. This is a 4 credit hour course, with laboratory, intended for physical scientists and (non-electrical) engineers. Electrical concepts will be developed based on modern needs and techniques: Current, Voltage, Components, Sources, Operational Amplifiers, Analysis Techniques, First and Second Order Circuits, Sinusoids and AC. Technical elective for non-ECE majors. prerequisites: Concurrent registration in MTH 165 and PHY 122 Location (M 6:15PM - 7:30PM)
OPT 210-7 Circuit Analysis for System Thinking Edward Herger R 10:00AM - 2:00PM
This course is formerly known as ECE 210 Circuits for non majors. This is a 4 credit hour course, with laboratory, intended for physical scientists and (non-electrical) engineers. Electrical concepts will be developed based on modern needs and techniques: Current, Voltage, Components, Sources, Operational Amplifiers, Analysis Techniques, First and Second Order Circuits, Sinusoids and AC. Technical elective for non-ECE majors. prerequisites: Concurrent registration in MTH 165 and PHY 122 Location (R 10:00AM - 2:00PM)
OPT 210-8 Circuit Analysis for System Thinking Edward Herger 7:00PM - 7:00PM
This course is formerly known as ECE 210 Circuits for non majors. This is a 4 credit hour course, with laboratory, intended for physical scientists and (non-electrical) engineers. Electrical concepts will be developed based on modern needs and techniques: Current, Voltage, Components, Sources, Operational Amplifiers, Analysis Techniques, First and Second Order Circuits, Sinusoids and AC. Technical elective for non-ECE majors. prerequisites: Concurrent registration in MTH 165 and PHY 122 Location ( 7:00PM - 7:00PM)
OPT 212-1 Matlab for Opt Majors II Gregory Savich M 10:25AM - 11:40AM
Prerequisites: OPT 211 or instructor's permission Location (M 10:25AM - 11:40AM)
OPT 212-2 Matlab for Opt Majors II Gregory Savich W 9:00AM - 10:00AM
Prerequisites: OPT 211 or instructor's permission Location (W 9:00AM - 10:00AM)
OPT 212-3 Matlab for Opt Majors II Gregory Savich F 9:00AM - 10:15AM
Prerequisites: OPT 211 or instructor's permission Location (F 9:00AM - 10:15AM)
OPT 241-1 Geometrical Optics Julie Bentley TR 2:00PM - 3:15PM
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations. Location (TR 2:00PM - 3:15PM)
OPT 241-2 Geometrical Optics Julie Bentley T 6:15PM - 7:30PM
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations. Location (T 6:15PM - 7:30PM)
OPT 241-3 Geometrical Optics Julie Bentley T 6:15PM - 7:30PM
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations. Location (T 6:15PM - 7:30PM)
OPT 241-4 Geometrical Optics Julie Bentley T 6:15PM - 7:30PM
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations. Location (T 6:15PM - 7:30PM)
OPT 241-5 Geometrical Optics Julie Bentley W 3:25PM - 4:40PM
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations. Location (W 3:25PM - 4:40PM)
OPT 241-6 Geometrical Optics Julie Bentley W 3:25PM - 4:40PM
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations. Location (W 3:25PM - 4:40PM)
OPT 241-7 Geometrical Optics Julie Bentley W 3:25PM - 4:40PM
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations. Location (W 3:25PM - 4:40PM)
OPT 241-8 Geometrical Optics Julie Bentley W 3:25PM - 4:40PM
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations. Location (W 3:25PM - 4:40PM)
OPT 241-9 Geometrical Optics Julie Bentley W 3:25PM - 4:40PM
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations. Location (W 3:25PM - 4:40PM)
OPT 242-1 Aberrations, Interferometry, and Metrology Brian Kruschwitz TR 12:30PM - 1:45PM
1) Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. 2) First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. 3) Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations. Location (TR 12:30PM - 1:45PM)
OPT 242-2 Aberrations, Interferometry, and Metrology Brian Kruschwitz F 3:25PM - 4:40PM
1) Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. 2) First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. 3) Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations. Location (F 3:25PM - 4:40PM)
OPT 243-1 Optical Fab. and Testing Jessica Nelson MW 3:25PM - 4:40PM
This course is designed to give engineers practical information about how optical components (lenses) are made and tested, and provide basic tools to create cost-effective optical system designs. Topics covered include optical material properties, grinding, polishing, CNC programming for optical fabrication, modern fabrication technologies, surface testing and fabrication tolerances. We will discuss case studies of challenging fabrication projects for leading-edge optical systems. The accompanying lab will use the facilities of the Hopkins Center fabrication and metrology labs to introduce polishing and metrology techniques. Lab exercises will include hands-on experiments, such as exploring the properties of optical materials, measuring the removal function of a sub-aperture polishing and grinding machines, and characterizing the surface form and texture of polished surfaces. Prerequisites: Students must in their Sophomore, Junior, or Senior year. Not for first-year undergraduates. Location (MW 3:25PM - 4:40PM)
OPT 243-3 Optical Fab. and Testing Jessica Nelson M 1:00PM - 3:00PM
This course is designed to give engineers practical information about how optical components (lenses) are made and tested, and provide basic tools to create cost-effective optical system designs. Topics covered include optical material properties, grinding, polishing, CNC programming for optical fabrication, modern fabrication technologies, surface testing and fabrication tolerances. We will discuss case studies of challenging fabrication projects for leading-edge optical systems. The accompanying lab will use the facilities of the Hopkins Center fabrication and metrology labs to introduce polishing and metrology techniques. Lab exercises will include hands-on experiments, such as exploring the properties of optical materials, measuring the removal function of a sub-aperture polishing and grinding machines, and characterizing the surface form and texture of polished surfaces. Prerequisites: Students must in their Sophomore, Junior, or Senior year. Not for first-year undergraduates. Location (M 1:00PM - 3:00PM)
OPT 243-4 Optical Fab. and Testing Jessica Nelson W 1:00PM - 3:00PM
This course is designed to give engineers practical information about how optical components (lenses) are made and tested, and provide basic tools to create cost-effective optical system designs. Topics covered include optical material properties, grinding, polishing, CNC programming for optical fabrication, modern fabrication technologies, surface testing and fabrication tolerances. We will discuss case studies of challenging fabrication projects for leading-edge optical systems. The accompanying lab will use the facilities of the Hopkins Center fabrication and metrology labs to introduce polishing and metrology techniques. Lab exercises will include hands-on experiments, such as exploring the properties of optical materials, measuring the removal function of a sub-aperture polishing and grinding machines, and characterizing the surface form and texture of polished surfaces. Prerequisites: Students must in their Sophomore, Junior, or Senior year. Not for first-year undergraduates. Location (W 1:00PM - 3:00PM)
OPT 243-5 Optical Fab. and Testing Jessica Nelson 7:00PM - 7:00PM
This course is designed to give engineers practical information about how optical components (lenses) are made and tested, and provide basic tools to create cost-effective optical system designs. Topics covered include optical material properties, grinding, polishing, CNC programming for optical fabrication, modern fabrication technologies, surface testing and fabrication tolerances. We will discuss case studies of challenging fabrication projects for leading-edge optical systems. The accompanying lab will use the facilities of the Hopkins Center fabrication and metrology labs to introduce polishing and metrology techniques. Lab exercises will include hands-on experiments, such as exploring the properties of optical materials, measuring the removal function of a sub-aperture polishing and grinding machines, and characterizing the surface form and texture of polished surfaces. Prerequisites: Students must in their Sophomore, Junior, or Senior year. Not for first-year undergraduates. Location ( 7:00PM - 7:00PM)
OPT 245-01 Precision Instrument Design Ethan Burnham-Fay TR 4:50PM - 6:05PM
This course focuses teaching the multidisciplinary aspects of designing complex, precise systems. In these systems, aspects from mechanics, optics, electronics, design for manufacturing/assembly, and metrology/qualification must all be considered to design, build, and demonstrate a successful precision system. The goal of this class is to develop a fundamental understanding of multidisciplinary design for designing the next generation of advanced instrumentation. This course is open to graduate students in engineering and physics backgrounds although it has a strong emphasis on mechanical engineering and systems engineering topics. This course is open to undergraduates who are in their senior year. Location (TR 4:50PM - 6:05PM)
OPT 246-1 Optical Interference Coating Jennifer Kruschwitz TR 3:25PM - 4:40PM
Optical interference in a multilayer stack and its application to anti-reflection coatings, beamsplitters, laser mirrors, polarizers, and bandpass filters. Prerequisites: OPT 262 Location (TR 3:25PM - 4:40PM)
OPT 253-1 Quantum and Nano-Optics Svetlana Lukishova M 8:00AM - 9:00AM
NOTE: the schedule for this course will be set by the instructor after polling ALL registered students for availability (ONE 1 hour per week lecture and ONE 1.5 hours per week lab). This laboratory course exposes students to cutting-edge photon counting instrumentation and methods with applications ranging from quantum information to nanotechnology, biotechnology and medicine. Major topics include quantum entanglement and Bells inequalities, single-photon interference, single-emitter confocal fluorescence microscopy and spectroscopy, photonic bandgap materials, Hanbury Brown and Twiss interferometer, and photon antibunching. For grading students should submit 3 group lab reports, maintain their lab journals and pass through MidTerm and Final (Big) Quizzes. Location (M 8:00AM - 9:00AM)
OPT 262-1 Electromagnetic Theory Andrew Berger TR 9:40AM - 10:55AM
Electromagnetic Theory: Maxwell's equations in differential form, dipole radiation, Rayleigh scattering, polarization,energy flow (Poynting vector), plane waves, wave propagation in air/glass/metals, reflection and refraction, birefringence, polarization-sensitive optical elements (wave plates and polarizers),applications to nonlinear and quantum optics. Location (TR 9:40AM - 10:55AM)
OPT 262-2 Electromagnetic Theory – M 2:00PM - 3:15PM
Electromagnetic Theory: Maxwell's equations in differential form, dipole radiation, Rayleigh scattering, polarization,energy flow (Poynting vector), plane waves, wave propagation in air/glass/metals, reflection and refraction, birefringence, polarization-sensitive optical elements (wave plates and polarizers),applications to nonlinear and quantum optics. Location (M 2:00PM - 3:15PM)
OPT 310-1 Senior Design I Wayne Knox MWF 11:50AM - 12:40PM
Specifications, project development, and project planning will include design alternatives and subsystem segmentation discussions. Prerequisites: Optics senior standing or permission from instructor. Location (MWF 11:50AM - 12:40PM)
OPT 320-1 Senior Thesis I Wayne Knox MWF 11:50AM - 12:40PM
Under faculty supervision, preparation for year-long independent research or participation in ongoing graduate group research. Students wishing to major in 'Optics' will register for this course. Prerequisite: Optics senior standing or instructor permission. Location (MWF 11:50AM - 12:40PM)
OPT 386V-1 Visiting Student in Optics – 7:00PM - 7:00PM
No description Location ( 7:00PM - 7:00PM)
OPT 390-1 Supervised Teaching – 7:00PM - 7:00PM
No description Location ( 7:00PM - 7:00PM)
OPT 391-1 Independent Study – 7:00PM - 7:00PM
Registration for Independent Study courses needs to be completed through the Independent Study Form Location ( 7:00PM - 7:00PM)
OPT 395-1 Independent Research – 7:00PM - 7:00PM
Registration for Independent Study courses needs to be completed through the Independent Study Form Location ( 7:00PM - 7:00PM)

Number	Title	Instructor	Time
Monday
OPT 253-1 Quantum and Nano-Optics Svetlana Lukishova
NOTE: the schedule for this course will be set by the instructor after polling ALL registered students for availability (ONE 1 hour per week lecture and ONE 1.5 hours per week lab). This laboratory course exposes students to cutting-edge photon counting instrumentation and methods with applications ranging from quantum information to nanotechnology, biotechnology and medicine. Major topics include quantum entanglement and Bells inequalities, single-photon interference, single-emitter confocal fluorescence microscopy and spectroscopy, photonic bandgap materials, Hanbury Brown and Twiss interferometer, and photon antibunching. For grading students should submit 3 group lab reports, maintain their lab journals and pass through MidTerm and Final (Big) Quizzes.
OPT 203-1 Instrumentation Lab Jennifer Kruschwitz
This laboratory complements OPT 242. Students experience further optical phenomena in the lab setting to better understand equipment that provides measurement and key optical data. Prerequisites: OPT 202 or instructor permission
OPT 212-1 Matlab for Opt Majors II Gregory Savich
Prerequisites: OPT 211 or instructor's permission
OPT 243-3 Optical Fab. and Testing Jessica Nelson
This course is designed to give engineers practical information about how optical components (lenses) are made and tested, and provide basic tools to create cost-effective optical system designs. Topics covered include optical material properties, grinding, polishing, CNC programming for optical fabrication, modern fabrication technologies, surface testing and fabrication tolerances. We will discuss case studies of challenging fabrication projects for leading-edge optical systems. The accompanying lab will use the facilities of the Hopkins Center fabrication and metrology labs to introduce polishing and metrology techniques. Lab exercises will include hands-on experiments, such as exploring the properties of optical materials, measuring the removal function of a sub-aperture polishing and grinding machines, and characterizing the surface form and texture of polished surfaces. Prerequisites: Students must in their Sophomore, Junior, or Senior year. Not for first-year undergraduates.
OPT 262-2 Electromagnetic Theory –
Electromagnetic Theory: Maxwell's equations in differential form, dipole radiation, Rayleigh scattering, polarization,energy flow (Poynting vector), plane waves, wave propagation in air/glass/metals, reflection and refraction, birefringence, polarization-sensitive optical elements (wave plates and polarizers),applications to nonlinear and quantum optics.
OPT 210-6 Circuit Analysis for System Thinking Edward Herger
This course is formerly known as ECE 210 Circuits for non majors. This is a 4 credit hour course, with laboratory, intended for physical scientists and (non-electrical) engineers. Electrical concepts will be developed based on modern needs and techniques: Current, Voltage, Components, Sources, Operational Amplifiers, Analysis Techniques, First and Second Order Circuits, Sinusoids and AC. Technical elective for non-ECE majors. prerequisites: Concurrent registration in MTH 165 and PHY 122
Monday and Wednesday
OPT 243-1 Optical Fab. and Testing Jessica Nelson
This course is designed to give engineers practical information about how optical components (lenses) are made and tested, and provide basic tools to create cost-effective optical system designs. Topics covered include optical material properties, grinding, polishing, CNC programming for optical fabrication, modern fabrication technologies, surface testing and fabrication tolerances. We will discuss case studies of challenging fabrication projects for leading-edge optical systems. The accompanying lab will use the facilities of the Hopkins Center fabrication and metrology labs to introduce polishing and metrology techniques. Lab exercises will include hands-on experiments, such as exploring the properties of optical materials, measuring the removal function of a sub-aperture polishing and grinding machines, and characterizing the surface form and texture of polished surfaces. Prerequisites: Students must in their Sophomore, Junior, or Senior year. Not for first-year undergraduates.
OPT 201-1 Geometrical Optics Lab Lect Michele Cotrufo
OPT 201 explores the geometrical optics (ray-based) imaging behavior of optical systems. This class consists of four lab modules. 1. Measurement Methods and Measurement Uncertainty 2. Object/Image Relationships 3. Measuring Focal Length and First-Order Properties 4. Resolution and Spatial Frequency The typical activities for each lab include a: • Lab Lecture (pre-recorded) that provides background, context and relevant theory for the lab activities and data analysis. • Homework assignment where the student practices analysis procedures relevant to the lab, • Pre-lab that goes over the procedures of the lab, • Data acquisition done in lab • Data analysis activity and • Lab report documenting the findings of the lab in a designated format.
Monday, Wednesday, and Friday
OPT 310-1 Senior Design I Wayne Knox
Specifications, project development, and project planning will include design alternatives and subsystem segmentation discussions. Prerequisites: Optics senior standing or permission from instructor.
OPT 320-1 Senior Thesis I Wayne Knox
Under faculty supervision, preparation for year-long independent research or participation in ongoing graduate group research. Students wishing to major in 'Optics' will register for this course. Prerequisite: Optics senior standing or instructor permission.
Tuesday
OPT 241-2 Geometrical Optics Julie Bentley
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations.
OPT 241-3 Geometrical Optics Julie Bentley
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations.
OPT 241-4 Geometrical Optics Julie Bentley
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations.
Tuesday and Thursday
OPT 201-2 Geometrical Optics Lab Lect Michele Cotrufo
OPT 201 explores the geometrical optics (ray-based) imaging behavior of optical systems. This class consists of four lab modules. 1. Measurement Methods and Measurement Uncertainty 2. Object/Image Relationships 3. Measuring Focal Length and First-Order Properties 4. Resolution and Spatial Frequency The typical activities for each lab include a: • Lab Lecture (pre-recorded) that provides background, context and relevant theory for the lab activities and data analysis. • Homework assignment where the student practices analysis procedures relevant to the lab, • Pre-lab that goes over the procedures of the lab, • Data acquisition done in lab • Data analysis activity and • Lab report documenting the findings of the lab in a designated format.
OPT 262-1 Electromagnetic Theory Andrew Berger
Electromagnetic Theory: Maxwell's equations in differential form, dipole radiation, Rayleigh scattering, polarization,energy flow (Poynting vector), plane waves, wave propagation in air/glass/metals, reflection and refraction, birefringence, polarization-sensitive optical elements (wave plates and polarizers),applications to nonlinear and quantum optics.
OPT 145-01 Cnc Grind for Precision Mfg Michael Pomerantz
No description
OPT 146-01 Cnc Finish & Precision Mfg Michael Pomerantz
No description
OPT 101-1 Introduction to Optics Thomas Brown
This course provides foundational knowledge of the science and technology of light. It includes energy, with special attention to solar cells, lenses and imaging, interference, diffraction, holography, lasers, photonics, optical technologies for the internet, and quantum optics. Students will have the opportunity to have a lab-based experience in faculty research labs. Small group workshops offer the opportunity for hands-on demonstrations and group practice in problem solving.
OPT 242-1 Aberrations, Interferometry, and Metrology Brian Kruschwitz
1) Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. 2) First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. 3) Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations.
OPT 241-1 Geometrical Optics Julie Bentley
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations.
OPT 201-3 Geometrical Optics Lab Lect Michele Cotrufo
OPT 201 explores the geometrical optics (ray-based) imaging behavior of optical systems. This class consists of four lab modules. 1. Measurement Methods and Measurement Uncertainty 2. Object/Image Relationships 3. Measuring Focal Length and First-Order Properties 4. Resolution and Spatial Frequency The typical activities for each lab include a: • Lab Lecture (pre-recorded) that provides background, context and relevant theory for the lab activities and data analysis. • Homework assignment where the student practices analysis procedures relevant to the lab, • Pre-lab that goes over the procedures of the lab, • Data acquisition done in lab • Data analysis activity and • Lab report documenting the findings of the lab in a designated format.
OPT 246-1 Optical Interference Coating Jennifer Kruschwitz
Optical interference in a multilayer stack and its application to anti-reflection coatings, beamsplitters, laser mirrors, polarizers, and bandpass filters. Prerequisites: OPT 262
OPT 245-01 Precision Instrument Design Ethan Burnham-Fay
This course focuses teaching the multidisciplinary aspects of designing complex, precise systems. In these systems, aspects from mechanics, optics, electronics, design for manufacturing/assembly, and metrology/qualification must all be considered to design, build, and demonstrate a successful precision system. The goal of this class is to develop a fundamental understanding of multidisciplinary design for designing the next generation of advanced instrumentation. This course is open to graduate students in engineering and physics backgrounds although it has a strong emphasis on mechanical engineering and systems engineering topics. This course is open to undergraduates who are in their senior year.
Wednesday
OPT 212-2 Matlab for Opt Majors II Gregory Savich
Prerequisites: OPT 211 or instructor's permission
OPT 243-4 Optical Fab. and Testing Jessica Nelson
This course is designed to give engineers practical information about how optical components (lenses) are made and tested, and provide basic tools to create cost-effective optical system designs. Topics covered include optical material properties, grinding, polishing, CNC programming for optical fabrication, modern fabrication technologies, surface testing and fabrication tolerances. We will discuss case studies of challenging fabrication projects for leading-edge optical systems. The accompanying lab will use the facilities of the Hopkins Center fabrication and metrology labs to introduce polishing and metrology techniques. Lab exercises will include hands-on experiments, such as exploring the properties of optical materials, measuring the removal function of a sub-aperture polishing and grinding machines, and characterizing the surface form and texture of polished surfaces. Prerequisites: Students must in their Sophomore, Junior, or Senior year. Not for first-year undergraduates.
OPT 241-5 Geometrical Optics Julie Bentley
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations.
OPT 241-6 Geometrical Optics Julie Bentley
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations.
OPT 241-7 Geometrical Optics Julie Bentley
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations.
OPT 241-8 Geometrical Optics Julie Bentley
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations.
OPT 241-9 Geometrical Optics Julie Bentley
Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations.
Wednesday and Friday
OPT 210-5 Circuit Analysis for System Thinking Edward Herger
This course is formerly known as ECE 210 Circuits for non majors. This is a 4 credit hour course, with laboratory, intended for physical scientists and (non-electrical) engineers. Electrical concepts will be developed based on modern needs and techniques: Current, Voltage, Components, Sources, Operational Amplifiers, Analysis Techniques, First and Second Order Circuits, Sinusoids and AC. Technical elective for non-ECE majors. prerequisites: Concurrent registration in MTH 165 and PHY 122
Thursday
OPT 210-7 Circuit Analysis for System Thinking Edward Herger
This course is formerly known as ECE 210 Circuits for non majors. This is a 4 credit hour course, with laboratory, intended for physical scientists and (non-electrical) engineers. Electrical concepts will be developed based on modern needs and techniques: Current, Voltage, Components, Sources, Operational Amplifiers, Analysis Techniques, First and Second Order Circuits, Sinusoids and AC. Technical elective for non-ECE majors. prerequisites: Concurrent registration in MTH 165 and PHY 122
Friday
OPT 212-3 Matlab for Opt Majors II Gregory Savich
Prerequisites: OPT 211 or instructor's permission
OPT 242-2 Aberrations, Interferometry, and Metrology Brian Kruschwitz
1) Introduction to geometrical optics: refractive index, optical path, Fermat’s principle, Snell’s law, paraxial and real ray tracing, marginal and chief rays, Gaussian optics, cardinal points, magnification, Lagrange invariant, numerical aperture, aperture stop, field stop, entrance and exit pupils, telecentricity, vignetting. 2) First order layout of optical systems: the eye, magnifiers, eyepieces, telescopes, microscopes, and camera objectives. Prisms and plane mirrors. 3) Introduction to aberration theory: first order chromatic aberrations, 3rd order monochromatic aberrations.