| Monday |
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OPT 203
KRUSCHWITZ J
M 9:00AM - 10:15AM
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This laboratory complements OPT 242. Students experience further optical phenomena in the lab setting to better understand equipment that provides measurement and key optical data.
BUILDING: HYLAN | ROOM: 202
PREREQUISITES: OPT 201, 202
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OPT 243 (OPT 243)
NELSON J
M 9:45AM - 11:45AM
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No description
BUILDING: GRGEN | ROOM: 427
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OPT 212
SAVICH G
M 10:25AM - 11:40AM
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No description
BUILDING: GRGEN | ROOM: 109
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| Monday and Wednesday |
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OPT 147 (ME 147)
POMERANTZ M
MW 1:00PM - 2:50PM
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course will provide a basic understanding of CNC sub-aperture form correction of pre-polished optical substrates using MRF technology (Magnetorheological Finishing).
BUILDING: GAVET | ROOM: 118
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OPT 243 (OPT 243)
NELSON J
MW 3:25PM - 4:40PM
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This course is designed to give engineers practical information about how optical components (lenses) are made and tested, and provide basic tools to create cost-effective optical system designs. Topics covered include optical material properties, grinding, polishing, CNC programming for optical fabrication, modern fabrication technologies, surface testing and fabrication tolerances. We will discuss case studies of challenging fabrication projects for leading-edge optical systems. The accompanying lab will use the facilities of the Hopkins Center fabrication and metrology labs to introduce polishing and metrology techniques. Lab exercises will include hands-on experiments, such as exploring the properties of optical materials, measuring the removal function of a sub-aperture polishing and grinding machines, and characterizing the surface form and texture of polished surfaces.
BUILDING: MOREY | ROOM: 205
PREREQUISITES: Courses limited to sophomores-seniors. Not recommended for freshmen.
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OPT 243 (OPT 243)
NELSON J
MW 4:50PM - 6:05PM
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No description
BUILDING: HYLAN | ROOM: 206
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OPT 245 (ME 445)
BURNHAM-FAY E
MW 4:50PM - 6:05PM
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This course focuses teaching the multidisciplinary aspects of designing complex, precise systems. In these systems, aspects from mechanics, optics, electronics, design for manufacturing/assembly, and metrology/qualification must all be considered to design, build, and demonstrate a successful precision system. The goal of this class is to develop a fundamental understanding of multidisciplinary design for designing the next generation of advanced instrumentation. This course open to graduate students in engineering and physics backgrounds although it has a strong emphasis on mechanical engineering and systems engineering topics. This course is open to undergraduates who are in their senior year.
BUILDING: HYLAN | ROOM: 102
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OPT 201
EASTMAN C
MW 6:15PM - 9:55PM
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Students examine, analyze, measure, dismantle and reverse-engineer a variety of new and used optical tools, apparatus and systems. Emphasis on conceptual understanding and intuitive problem-solving.
BUILDING: WILMT | ROOM: 504
PREREQUISITES: Optics sophomore standing or permission of instructor.
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| Monday, Wednesday, and Friday |
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OPT 310
KNOX W
MWF 11:50AM - 12:40PM
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Specifications, project development, and project planning will include design alternatives and subsystem segmentation discussions.
BUILDING: GAVET | ROOM: 301
PREREQUISITES: Open only to Optics Seniors
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OPT 320
KNOX W
MWF 11:50AM - 12:40PM
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Under faculty supervision, preparation for year-long independent research or participation in ongoing graduate group research. Students wishing to major in "Optics" will register for this course.
BUILDING: GAVET | ROOM: 301
PREREQUISITES: Open to Optics seniors only.
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| Tuesday |
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OPT 203
KRUSCHWITZ J
T 6:15PM - 9:15PM
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No description
BUILDING: GRGEN | ROOM: 427
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OPT 241
BENTLEY J
T 6:15PM - 7:30PM
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No description
BUILDING: GRGEN | ROOM: 417
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OPT 241
BENTLEY J
T 6:15PM - 7:30PM
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No description
BUILDING: GRGEN | ROOM: 509
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| Tuesday and Thursday |
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OPT 262 (OPT 262)
BERGER A
TR 9:40AM - 10:55AM
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Electromagnetic Theory: Maxwell's equations in differential form, dipole radiation, Rayleigh scattering, polarization,energy flow (Poynting vector), plane waves, wave propagation in air/glass/metals, reflection and refraction, birefringence, polarization-sensitive optical elements (wave plates and polarizers),applications to nonlinear and quantum optics.
BUILDING: GAVET | ROOM: 312
PREREQUISITES: MTH 165 (may be taken concurrently with permission of instructor), MTH 164, PHY 122 or 142
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OPT 242
ROLLAND J
TR 12:30PM - 1:45PM
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Geometrical and diffraction theory of image formation. Measurement of first-order properties. Seidel aberrations. Tests of aberrated systems. Seidel contribution formulae and more. Optics majors have more fun!
BUILDING: HUTCH | ROOM: 473
PREREQUISITES: OPT 241, OPT 261
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OPT 145 (ME 145)
POMERANTZ M
TR 12:30PM - 2:20PM
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Course will provide a basic understanding of CNC machining and deterministic micro grinding processes for spherical and aspheric shapes in optical substrates.
BUILDING: GAVET | ROOM: 118
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OPT 146 (ME 146)
POMERANTZ M
TR 12:30PM - 2:20PM
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Students will gain an understanding in CNC sub-aperture fine grinding, and polishing of spherical and aspheric surfaces.
BUILDING: GAVET | ROOM: 118
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OPT 101 (OPT 101)
BROWN T
TR 12:30PM - 1:45PM
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A discussion of the properties of light: refraction, imaging, diffraction, interference, the development of the microscope, telescope, laser, the Internet, information storage and display, and medical applications. Demonstrations.
The EAS10X seminar/workshop is required for all students taking an EAS10X course for credit. Seminars discuss engineering and applied sciences in the real world, and provide overviews of Optics, Computer Science, Mechanical Engineering, Biomedical Engineering, Electrical and Computer Engineering, Audio and Music Engineering, and Chemical Engineering.
BUILDING: GRGEN | ROOM: 108
PREREQUISITES: None.
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OPT 241
BENTLEY J
TR 2:00PM - 3:15PM
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Optical instruments and their uses. First-order Gaussian optics and thin-lens system layout. Photometric theory applied to optical systems. The eye, magnifier, microscope, matrix optics, nature of Seidel aberrations.
BUILDING: GRGEN | ROOM: 108
PREREQUISITES: MTH 161, MTH 162, PHY 121 (or MTH 141/142/143/PHY113)
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OPT 246 (OPT 246)
OLIVER J
TR 3:25PM - 4:40PM
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Optical interference in a multilayer stack and its application to anti-reflection coatings, beamsplitters, laser mirrors, polarizers, and bandpass filters.
BUILDING: GAVET | ROOM: 312
PREREQUISITES: OPT 262
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OPT 249 (OPT 249)
COBB J
TR 4:50PM - 6:05PM
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This course is intended as an overview to the design and analysis of illumination systems along with an introduction to the use of Light Tools software. The classes alternate between lectures on an illumination topic, which includes many examples, and a working lab learning skills in Light Tools. The Lecture/Labs would be complimentary so that the skills developed in using the software reinforce the topics covered in the Lectures.
BUILDING: GAVET | ROOM: 208
PREREQUISITES: OPT 241, OPT225 recommended
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OPT 201
EASTMAN C
TR 6:15PM - 9:55PM
|
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Students examine, analyze, measure, dismantle and reverse-engineer a variety of new and used optical tools, apparatus and systems. Emphasis on conceptual understanding and intuitive problem-solving.
BUILDING: WILMT | ROOM: 504
PREREQUISITES: Optics sophomore standing or permission of instructor.
|
| Wednesday |
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OPT 212
SAVICH G
W 8:00AM - 8:50AM
|
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No description
BUILDING: GRGEN | ROOM: 102
|
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OPT 241
BENTLEY J
W 3:25PM - 4:40PM
|
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No description
BUILDING: GRGEN | ROOM: 509
|
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OPT 241
BENTLEY J
W 3:25PM - 4:40PM
|
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No description
BUILDING: GRGEN | ROOM: 417
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OPT 203
KRUSCHWITZ J
W 6:15PM - 9:15PM
|
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No description
BUILDING: GRGEN | ROOM: 427
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| Thursday |
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OPT 243 (OPT 243)
NELSON J
R 9:00AM - 12:00PM
|
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No description
BUILDING: GRGEN | ROOM: 427
|
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OPT 243 (OPT 243)
NELSON J
R 3:00PM - 6:00PM
|
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No description
BUILDING: GRGEN | ROOM: 427
|
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OPT 203
KRUSCHWITZ J
R 6:15PM - 9:15PM
|
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No description
BUILDING: GRGEN | ROOM: 427
|
| Friday |
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OPT 212
SAVICH G
F 9:00AM - 10:15AM
|
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No description
BUILDING: GRGEN | ROOM: 102
|
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OPT 242
ROLLAND J
F 10:25AM - 11:40AM
|
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No description
BUILDING: HUTCH | ROOM: 473
|
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OPT 203
KRUSCHWITZ J
F 12:30PM - 3:30PM
|
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No description
BUILDING: GRGEN | ROOM: 427
|
| TBA |
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OPT 253 (OPT 253)
LUKISHOVA S
–
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This laboratory course (3 hours per week) exposes
students to cutting-edge photon counting instrumentation and methods with applications ranging from quantum information to nanotechnology,biotechnology and medicine. Major topics include quantum entanglement and Bell’s inequalities, single-photon interference, single-emitter
confocal fluorescence microscopy and spectroscopy, photonic bandgap materials, Hanbury Brown and Twiss interferometer, and photon antibunching. Each lab also includes lecture and discussions of lab materials.
BUILDING: | ROOM:
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OPT 386V
–
–
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No description
BUILDING: | ROOM:
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OPT 391
–
–
|
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No description
BUILDING: | ROOM:
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OPT 393
–
–
|
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No description
BUILDING: | ROOM:
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OPT 394
–
–
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No description
BUILDING: | ROOM:
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OPT 395
–
–
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No description
BUILDING: | ROOM:
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OPT 396
–
–
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No description
BUILDING: | ROOM:
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